Principles of Chemical Vapor Deposition PDF
By:Daniel Dobkin,M.K. Zuraw
Published on 2013-03-09 by Springer Science & Business Media
Principles of Chemical Vapor Deposition provides a simple introduction to heat and mass transfer, surface and gas phase chemistry, and plasma discharge characteristics. In addition, the book includes discussions of practical films and reactors to help in the development of better processes and equipment. This book will assist workers new to chemical vapor deposition (CVD) to understand CVD reactors and processes and to comprehend and exploit the literature in the field. The book reviews several disparate fields with which many researchers may have only a passing acquaintance, such as heat and mass transfer, discharge physics, and surface chemistry, focusing on key issues relevant to CVD. The book also examines examples of realistic industrial reactors and processes with simplified analysis to demonstrate how to apply the principles to practical situations. The book does not attempt to exhaustively survey the literature or to intimidate the reader with irrelevant mathematical apparatus. This book is as simple as possible while still retaining the essential physics and chemistry. The book is generously illustrated to assist the reader in forming the mental images which are the basis of understanding.
This Book was ranked at 26 by Google Books for keyword Depositions.
Book ID of Principles of Chemical Vapor Deposition's Books is VXj8CAAAQBAJ, Book which was written byDaniel Dobkin,M.K. Zurawhave ETAG "uPBRhY7fHIw"
Book which was published by Springer Science & Business Media since 2013-03-09 have ISBNs, ISBN 13 Code is 9789401703697 and ISBN 10 Code is 9401703698
Reading Mode in Text Status is false and Reading Mode in Image Status is true
Book which have "273 Pages" is Printed at BOOK under CategoryTechnology and Engineering
Book was written in en
eBook Version Availability Status at PDF is true and in ePub is false
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