Atomic Layer Deposition PDF
By:Tommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Sherman
Published on 2013-05-17 by John Wiley & Sons
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
This Book was ranked at 31 by Google Books for keyword Depositions.
Book ID of Atomic Layer Deposition's Books is gTrGuGJ8cgwC, Book which was written byTommi Kääriäinen,David Cameron,Marja-Leena Kääriäinen,Arthur Shermanhave ETAG "RZ5HBbYCZbs"
Book which was published by John Wiley & Sons since 2013-05-17 have ISBNs, ISBN 13 Code is 9781118747384 and ISBN 10 Code is 1118747380
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Book which have "272 Pages" is Printed at BOOK under CategoryTechnology and Engineering
Book was written in en
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