Chemical Vapor Deposition of Refractory Metals and Ceramics III: PDF
By:Bernard M. Gallois,Woo Y. Lee,Michael A. Pickering
Published on 1995-04-05 by Materials Research Society
CVD (chemical vapor deposition) technology is receiving much interest in the scientific community, in particular for synthesizing new materials with tailored chemical composition and physical properties that offer multiple functionality. Multiphase or multilayered films, functionally graded materials (FGMs), |smart| material structures and nanocomposites are just a few examples of the new classes of materials being produced via CVD. This third volume in the series from MRS offers an interdisciplinary perspective on technological issues relevant to CVD materials and processes, and provides a forum for the exchange of new scientific results. Topics include: fundamentals, modeling and diagnostics; process/microstructure/property relationships; diamond, cubic boron nitride and related materials; organometallic chemical vapor deposition and novel approaches.
This Book was ranked at 41 by Google Books for keyword Depositions.
Book ID of Chemical Vapor Deposition of Refractory Metals and Ceramics III:'s Books is rAJHAAAAYAAJ, Book which was written byBernard M. Gallois,Woo Y. Lee,Michael A. Pickeringhave ETAG "j0PU7juxDcs"
Book which was published by Materials Research Society since 1995-04-05 have ISBNs, ISBN 13 Code is 9781558992641 and ISBN 10 Code is 1558992642
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