Ionized Physical Vapor Deposition PDF
By:Jeffrey A. Hopwood
Published on 2000 by Elsevier
The tools and processes covered include DC hollow cathode magnetrons, RF inductively coupled plasmas, and microwave plasmas that are used for depositing technologically important materials such as copper, tantalum, titanium, TiN, and aluminum. In addition, this volume describes the important physical processes that occur in I-PVD in a simple and concise way. The physical descriptions are followed by experimentally-verified numerical models that provide in-depth insight into the design and operation I-PVD tools. Practicing process engineers, research and development scientists, and students will find that this book's integration of tool design, process development, and fundamental physical models make it an indispensable reference.-
This Book was ranked at 23 by Google Books for keyword Depositions.
Book ID of Ionized Physical Vapor Deposition's Books is E5sAZ0gll_AC, Book which was written byJeffrey A. Hopwoodhave ETAG "oweBf0iLm/U"
Book which was published by Elsevier since 2000 have ISBNs, ISBN 13 Code is 9780125330275 and ISBN 10 Code is 0125330278
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