Plasma Deposition of Amorphous Silicon-Based Materials PDF
By:Pio Capezzuto,Arun Madan
Published on 1995-10-10 by Elsevier
Semiconductors made from amorphous silicon have recently become important for their commercial applications in optical and electronic devices including FAX machines, solar cells, and liquid crystal displays. Plasma Deposition of Amorphous Silicon-Based Materials is a timely, comprehensive reference book written by leading authorities in the field. This volume links the fundamental growth kinetics involving complex plasma chemistry with the resulting semiconductor film properties and the subsequent effect on the performance of the electronic devices produced. Focuses on the plasma chemistry of amorphous silicon-based materials Links fundamental growth kinetics with the resulting semiconductor film properties and performance of electronic devices produced Features an international group of contributors Provides the first comprehensive coverage of the subject, from deposition technology to materials characterization to applications and implementation in state-of-the-art devices
This Book was ranked at 40 by Google Books for keyword Depositions.
Book ID of Plasma Deposition of Amorphous Silicon-Based Materials's Books is kIMVkF8Emu0C, Book which was written byPio Capezzuto,Arun Madanhave ETAG "7WSqxUPgkEY"
Book which was published by Elsevier since 1995-10-10 have ISBNs, ISBN 13 Code is 9780080539102 and ISBN 10 Code is 0080539106
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Book which have "324 Pages" is Printed at BOOK under CategoryScience
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